研究業績

2019年以降の英語原著論文について掲載しています。それ以前のものについてはT2R2(東工大リサーチリポジトリー)をご覧ください。

学会発表・特許等につきましてもT2R2(東工大リサーチリポジトリー)をご覧ください。

2021

    • Takao Shimizu, Yuki Tashiro, Takanori Mimura, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko J. Konnno, Osami Sakata, and Hiroshi Funakubo, “Electric-field-induced ferroelectricity in 5%Y-doped Hf0.5Zr0.5O2: Transformation from the paraelectric tetragonal phase to the ferroelectric orthorhombic phase”, Physica Status Solidi, 15[5], 2000589-1-7(2021).
    • Takanori Mimura, Takao Shimizu, Osami Sakata, and Hiroshi Funakubo, “Large Thermal hysteresis of ferroelectric transition in HfO2-based ferroelectric films”, Appl. Phys. Let., 118, 112903(2021).
    • Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takao Shimizu, Tomoaki Yamada, and Hiroshi Funakubo, “Preparation of 1 μm-thick Y-doped HfO2 ferroelectric films on (111)Pt/TiOx/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties”, Jpn. J. Appl. Phys., 60, 031009(2021).
    • Daichi Ichinose, Takao Shimizu, Osami Sakata, Tomoaki Yamada, Yoshitaka Ehara, and Hirosh Funakubo, “Domain structure transition in compressive strained (100)/(001) epitaxial tetragonal PZT film”, J. Appl. Phys., 129, 024101-1-6(2021).

    2020

    • Yoshiomi Hiranaga, Takanori Mimura, Takao Shimizu, Hiroshi Funakubo, and Yasuo Cho, “Local C-V mapping for ferroelectrics using scanning nonlinear dielectric microscopy”, J. Appl. Phys., 128, 244105(2020).
    • Rama K. Vasudevan, Kyle P. Kelley, Eugene Eliseev, Stephen Jesse, Hiroshi Funakubo, Anna Morozovska, and Sergei V. Kalinin, “Bayesian inference in band excitation Scanning Probe Microscopy for optimal dynamic model selection in imaging”, J. Appl. Phys., 128, 054105-1-10(2020).
    • Masanori Kodera, Takao Shimizu, and Hiroshi Funakubo, “Epitaxial Crystal Growth of Bismuth Silicate Driven by Fluorite-Like Layers”, Cryst. Growth Des., 20, 7163−7169(2020).
    • Atsuo Katagiri, Mutsuo Uehara, Mao Kurokawa, Kensuke Akiyama, Takao Shimizu, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, and Hiroshi Funakubo, “Composition Dependence of Crystal Structures and Electrical Properties of Ca-Mg-Si Films Prepared by Sputtering”, Journal of ELECTRONIC MATERIALS, 49[12], 7509-7517(2020).
    • Akinori Tateyama, Yoshiharu Ito, Yoshiko Nakamura, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Takeshi Yoshimura, and Hiroshi Funakubo, “Good piezoelectricity of self-polarized thick epitaxial (K,Na)NbO3 films grown below the Curie temperature (240°C) using a hydrothermal method”, Appl. Phys. Lett., 117, 142903-1-6(2020).
    • Shinnosuke Yasuoka, Takao Shimizu, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Yoshiomi Hiranaga, Yasuo Cho, and Hiroshi Funakubo, “Effects of deposition conditions on the ferroelectric properties of (Al1-xScx)N thin films”, J. Appl. Phys., 128, 114103-1-11(2020).
    • Kyle Kelley, Linglong Li, Yao Ren, Yoshitaka Ehara, Hiroshi Funakubo, Suhas Somnath, Stephen Jesse, Ye Cao, Ramakrishnan Kannan, Rama Vasudevan, and Sergei Kalinin, “Tensor factorization for elucidating mechanisms of piezoresponse relaxation via dynamic piezoresponse force spectroscopy”, npj Computational Materials, 6, 113(2020).
    • Hiroshi Uchida, Masaki Okura, Yoshiharu Ito, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, and Hiroshi Funakubo, “Rapid deposition of (K,Na)NbO3 thick films using microwave-assisted hydrothermal technique”, Jpn. J. Appl. Phys., 59, SPPB02(2020).
    • Mitsumasa Nakajima, Takao Shimizu, Hiroshi Nakaki, Tomoaki Yamada, Ayumi Wada, Takaaki Nakashima, Yoshitaka Ehara, and Hiroshi Funakubo, “Large electromechanical responses driven by electrically induced dense ferroelastic domains: beyond morphotropic phase boundary”, ACS Appl. Electron. Mater. 2020, 2, 1908−1916(2020).
    • Kyle P. Kelley, Yao Ren, Anna N. Morozovska, Eugene A. Eliseev, Yoshitaka Ehara, Hiroshi Funakubo, Thierry Giamarchi, Nina Balke, Rama K. Vasudevan, Ye Cao, Stephen Jesse, and Sergei V. Kalinin, “Dynamic Manipulation in Piezoresponse Force Microscopy: Creating Nonequilibrium Phases with Large Electromechanical Response”, ACS Nano 2020, 14, 10569−10577(2020).
    • Yu Huang, Yoshiharu Ito, Akinori Tateyama, Minoru Kurosawa, and Hiroshi Funakubo, “Crystal structure and properties of epitaxial (1-x)(Bi0.5Na0.5)TiO3-x(Bi0.5K0.5)TiO3 films grown by hydrothermal method”, Jpn. J. Appl. Phys., 59, SPPB10-1-8(2020).
    • Yoshitaka Ehara, Takaaki Nakashima, Daichi Ichinose, Takao Shimizu, Tomoaki Yamada, Ken Nishida, and Hiroshi Funakubo, “Temperature dependence on the domain structure of epitaxial PbTiO3 films grown on single-crystal substrates with different lattice parameters”, Jpn. J. Appl. Phys., 59, SPPB01-1-5(2020).
    • Akinori Tateyama, Yoshiharu Ito, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Takeshi Yoshimura, and Hiroshi. Funakubo, “Composition dependency of direct and inverse transverse piezoelectric property in self-polarized epitaxial (KxNa1-x)NbO3 films grown by hydrothermal method”, Jpn. J. Appl. Phys., 59, SPPC03-1-7(2020).
    • Hiroki Tanaka, Kiyoshi Uchiyama, Takao Shimizu, and Hiroshi Funakubo, “Optimization of deposition conditions of Y doped-SrZrO3 thin films fabricated by pulsed laser deposition”, J. Ceram. Soc. Jpn., 128[8], 436-440(2020).
    • Yoshiharu Ito, Akinori Tateyama, Yoshiko Nakamura, Takao Shimizu, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Mutsuo Ishikawa, Nobuhiro Kumada, and Hiroshi Funakubo, “High yield preparation of (100)c-oriented (K,Na)NbO3 thick films by hydrothermal method using amorphous niobium source”, J. Ceram. Soc. Jpn., 128[8], 512-517(2020).
    • Reijiro Shimura, Takanori Mimura, Takao Shimizu, Yoshitomo Tanaka, Yukari Inoue, and Hiroshi Funakubo, “Preparation of near-1-µm-thick {100}-oriented epitaxial Y-doped HfO2 ferroelectric films on (100)Si substrates by an RF magnetron sputtering method”, J. Ceram. Soc. Jpn., 128[8], 539-543(2020).
    • Kazuki Okamoto, Tomoaki Yamada, Kentaro Nakamura, Hidenori Takana, Osami Sakata, Mick Phillips, Takanori Kiguchi, Masahito Yoshino, Hiroshi Funakubo, and Takanori Nagasaki, “Enhanced intrinsic piezoelectric response in (001)-epitaxial single c-domain Pb(Zr,Ti)O3 nanorods”, Appl. Phys. Lett., 117, 042905-1-5(2020).
    • Y. Shiotsu, S. Yamamoto, Y. Shuto, H. Funakubo, M. K. Kurosawa, S. Sugahara, “Modeling and Design of a New Piezoelectronic Transistor for Ultralow-Voltage High-Speed Integrated Circuits”, IEEE Trans. on Electron Devices, vol. 67, no. 9, pp. 3852-3860, Aug. 2020.
    • Keisuke Yazawa, Benjamin Ducharne, Hiroshi Uchida, Hiroshi Funakubo, and John E. Blendell, “Barkhausen Noise Analysis of Thin Film Ferroelectrics”, Appl. Phys. Lett., Vol. 117, pp. 012902-1-4, June 2020.
    • Takahisa Shiraishi, Yuta Muto, Yoshiharu Ito, Takanori Kiguchi, Kazuhisa Sato, Masahiko Nishijima, Hidehiro Yasuda, Hiroshi Funakubo, and Toyohiko J. Konno, “Structural and electrical characterization of hydrothermally-deposited piezoelectric (K,Na)(Nb,Ta)O3 thick films”, J. Mater. Sci., Vol. 55, pp. 8829–8842, Apr. 2020.
    • Masanori Kodera, Ayako Taguchi, Takao Shimizu, Hiroki Moriwake, and Hiroshi Funakubo, “FabricationFabrication and characterization of ReO3-type dielectric films”, J. Mater. Chem. C, Vol. 8, No. 14, pp. 4680-4684, Mar. 2020.
    • Yoshiyuki Seki, Yutaka Sawada, Hiroshi Funakubo, Kazuhisa Kawano, and Noriaki Oshima, “Preparation of iridium metal films by spray chemical vapor deposition”, MRS Advances, 5(31-32), 1681-1685, Feb. 2020.
    • Takanori Mimura, Takao Shimizu, Hiroshi Uchida, and Hiroshi Funakubo, “Room-temperature deposition of ferroelectric HfO2-based films by the sputtering method”, Appl. Phys. Lett., Vol. 116, pp. 062901-1-5, Feb. 2020.
    • Takanori Mimura, Takao Shimizu, Yoshio Katsuya, Osami Sakata, and Hiroshi Funakubo, “Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films”, Jpn. J. Appl. Phys., Vol. 59, pp. SGGB04-1-6, Feb. 2020.
    • Joel Molina-Reyes, Takuya Hoshii, Shun-Ichiro Ohmi, Hiroshi Funakubo, Atsushi Hori, Ichiro Fujiwara, Hitoshi Wakabayashi, Kazuo Tsutsui, and Kuniyuki Kakushima, “NiSi2 as a Bottom Electrode for Enhanced Endurance of Ferroelectric Y-doped HfO2 Thin Films”, Jpn. J. Appl. Phys., Vol. 59, pp. SGGB06-1-6, Feb. 2020.
    • Atsuo Katagiri, Shota Ogawa, Takao Shimizu, Masaaki Matsushima, Kensuke Akiyama, Hiroshi Uchida, and Hiroshi Funakubo, “Epitaxial growth of Mg2Si films on (111) Si substrates covered with epitaxial SiC layers”, Jpn. J. Appl. Phys., Vol. 59, pp. SF1001-1-4, Jan. 2020.
    • Kodai Aoyama, Takao Shimizu, Hideto Kuramochi, Masami Mesuda, Ryo Akiike, Keisuke Ide, Takayoshi Katase, Toshio Kamiya, Yoshisato Kimura, and Hiroshi Funakubo, “Fabrication and characterization of CaxSr1-x)Si2 films prepared by co-sputtering method”, MRS Advances, 5(10), 451-458, Jan. 2020.
    • Kodai Aoyama, Takao Shimizu, Hideto Kuramochi, Masami Mesuda, Ryo Akiike, Keisuke Ide, Takayoshi Katase, Toshio Kamiya, Yoshisato Kimura, and Hiroshi Funakubo, “Thermoelectric (BaxSr1–x)Si2 films prepared by sputtering method over the barium solubility limit”, Jpn. J. Appl. Phys., vol. 59, pp. SFFB02-1-6, Jan. 2020.

    2019

      • Hyeon Jun Lee, Takao Shimizu, Hiroshi Funakubo, Yasuhiko Imai, Osami Sakata, Seung Hyun Hwang, Tae Yeon Kim, Changjae Yoon, Cheng Dai, Long Q. Chen, Su Yong Lee, Ji Young Jo. “Electric-Field-Driven Nanosecond Ferroelastic-Domain Switching Dynamics in Epitaxial Pb(Zr,Ti)O3 Film,” Phys. Rev. Lett., Vol. 123, pp. 217601, Nov. 2019.
      • Yoshitaka Ehara, Takao Shimizu, Shintaro Yasui, Takahiro Oikawa, Takahisa Shiraishi, Hiroki Tanaka, Noriyuki Kanenko, Ronald Maran, Tomoaki Yamada, Yasuhiko Imai, Osami Sakata, Nagarajan Valanoor, Hiroshi Funakubo. “Ferroelastic Domain Motion by Pulsed Electric Field in (111)/(11-1) Rhombohedral Epitaxial Pb(Zr0.65Ti0.35)O3 Thin Films: Fast Switching and Rrelaxation,” Physical Review B, vol. 100, pp. 104116 1-7, Sep. 2019.
      • P.S. Sankara Rama Krishnan, Anna N. Morozovska, Eugene A. Eliseev, Shota Ogawa, Atsuo Katagiri, Masaaki Matsushima, Kensuke Akiyama, Hiroshi Uchida, Hiroshi Funakubo. “Kinetics of Interfacial Microstructural Variation across Insulator-Thermoelectric Semiconductor interface and its Effects on Thermoelectric Properties of Magnesium Silicide Thin Films,” Materialia, Vol. 7, pp. 100340, Sep. 2019.
      • Yoshiharu Ito, Akinori Tateyama, Yoshiko Nakamura, Takao Shimizu, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Mutsuo Ishikawa, Hiroshi Funakubo. “Growth of epitaxial (K, Na)NbO3 films with various orientations by hydrothermalmethod and their properties,” Jpn. J. Appl. Puys., Vol. 58, pp. SLLB14, Sep. 2019.
      • Junpei Morishita, Hirokazu Kazama, Yusuke Sato, Hiroshi Funakubo. “Epitaxial growth of (Bi,K)TiO3-Bi(Mg,Ti)O3 (001) films and their ferroelectric and piezoelectric properties,” Jpn. J. Appl. Phys., Vol. 58, pp. SLLB13, Sep. 2019.
      • Masanori Kodera, Takao Shimizu, Hiroshi Funakubo. “Ferroelectric properties of epitaxial Bi2SiO5 thin films grown on SrTiO3 substrates with various orientations,” Jpn. J. Appl. Phys., Vol. 58, pp. SLLB04, Aug. 2019.
      • Tomoya Sato, Takanor Kiguchi, Toyohiko Konno, Junichi Kimura, Daichi Ichinose, Takanori Mimura, Hiroshi Funakubo, Kiyoshi Uchiyama. “Growth of (110)-one-axis-oriented perovskite-type oxide thin films with local epitaxy on (111)SrTiO3 single crystal substrates,” Jpn. J. Appl. Phys., Vol. 58, pp. SLLB01, Aug. 2019.
      • Hidehisa Inoue, Takao Shimizu, Hiroshi Funakubo. “Electric field-induced change in the crystal structure of MOCVD-Pb(Zr,Ti)O3 films near the phase boundary,” Jpn. J. Appl. Phys., Vol. 58, pp. SLLB07, Aug. 2019.
      • Yuta Muto, Takahisa Shiraishi, Yoshiharu Ito, Akinori Tateyama, Hiroshi Uchida, Takanori Kiguchi, Hiroshi Funakubo, Toyohiko J. Konno. “Effect of Ta-substitution on the deposition of (K,Na)(Nb,Ta)O3 films by hydrothermal method,” Jpn. J. Appl. Phys., Vol. 58, pp. SLLB12, Aug. 2019.
      • Takanori Mimura, Takao Shimizu, Hiroshi Funakubo. “Ferroelectricity in YO1.5-HfO2 films around 1 μm in thickness,” Appl. Phys. Lett., Vol. 115, pp. 032901, Jul. 2019.
      • Yoshiharu ITO, Akinori TATEYAMA, Yoshiko NAKAMURA, Takao SHIMIZU, Minoru KUROSAWA, Hiroshi UCHIDA, Takahisa SHIRAISHI, Takanori KIGUCHI, Toyohiko J. KONNO, Mutsuo ISHIKAWA, Hiroshi FUNAKUBO. “Deposition of orientation-controlled thick (K, Na)NbO3 films on metal substrates by repeated hydrothermal deposition technique,” Journal of the Ceramic Society of Japan, Vol. 127, No. 7, pp. 478-484, Jul. 2019.
      • T. Shiraishi, S. Choi, T. Kiguchi, T. Shimizu, H. Funakubo, T. J. Konno. “Formation of the orthorhombic phase in CeO2-HfO2 solid solution epitaxial thin films and their ferroelectric properties,” Appl. Phys. Lett., Vol. 14, pp. 232902-1-5, Jun. 2019.
      • Kodai AOYAMA, Takao SHIMIZU, Hideto KURAMOCHI, Masami MESUDA, Ryo AKIIKE, Yoshisato KIMURA, Hiroshi FUNAKUBO. “Evaluation of phase and thermoelectric properties of thin film SrSi2,” Journal of the Ceramic Society of Japan, Vol. 127, No. 6, pp. 394-398, Jun. 2019.
      • Takahisa SHIRAISHI, Yuta MUTO, Yoshiharu ITO, Akinori TATEYAMA, Hiroshi UCHIDA, Takanori KIGUCHI, Minoru K. KUROSAWA, Hiroshi FUNAKUBO, Toyohiko. J. KONNO. “Low-temperature deposition of Li substituted (K,Na)NbO3 films by a hydrothermal method and their structural and ferroelectric properties,” Journal of the Ceramic Society of Japan, Vol. 127, No. 6, pp. 388-393, Jun. 2019.
      • Lu Yo, Yang Zhang, Shuang Zhou, Apoorva Chaturvedi, Samuel A. Morris, Fucai Liu, Lei Chang, Daichi Ichinose, Hiroshi Funakubo, Weijin Hu, Tom Wu, Zheng Liu, Shuai Dong, Junling Wang. “Origin of giant negative piezoelectricity in a layered van der Waals ferroelectric,” Science Advances, Vol. 5, No. 4, pp. eaav3780, Apr. 2019.
      • Akinori Tateyama, Yoshiharu Ito, Yoshiko Nakamura, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Nobuhiro Kumada, Hiroshi Funakubo. “Effects of starting materials on the deposition behavior of hydrothermally synthesized {100}c -oriented epitaxial (K,Na)NbO3 thick films and their ferroelectric and piezoelectric properties,” J. Crystal Growth, Vol. 511, pp. 1-7, Apr. 2019.
      • Joe Sakai, Maxime Bavencoffe, Beatrice Negulescu, Patrice Limelette, Jérôme Wolfman, Akinori Tateyama, Hiroshi Funakubo. “Strain-induced resistance change in V2O3 films on piezoelectric ceramic disks,” J. Appl. Phys., Vol. 125, pp. 115102-1-6, Mar. 2019.
      • Mutsuo Uehara, Atsuo Katagiri, Mao Kurokawa, Kensuke Akiyama, Takao Shimizu, Masaaki Matsushima, Hiroshi Uchida, Yoshisato Kimura, Hiroshi Funakubo. “Preparation of CaMgSi and Ca7Mg7.25Si14 single phase films and their thermoelectric properties,” MRS Adv., Vol. 4, No. 25-26, pp. 1503-1508, Feb. 2019.
      • Takanori Mimura, Takao Shimizu, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. “Effects of heat treatment and in-situ high temperature XRD study on the formation of ferroelectric epitaxial Y doped HfO2 film,” Jpn. J. Appl. Phys., Vol. 58, pp. SBBB09-1-5, Feb. 2019.
      • Masamichi NISHIDE, Shintaro YOKOYAMA, Hiroshi FUNAKUBO, Takashi KATODA, Ken NISHIDA. “Impact of stress on the crystal structural nonuniformity along the film thickness direction by microfabrication of Pb(Zr, Ti)O3 island with morphotropic phase boundary composition,” Journal of the Ceramic Society of Japan, Vol. 127, No. 2, pp. 123-126, Feb. 2019.
      • Kensuke Akiyama, Sakiko Nojima, Ryo Takahashi, Yoshihisa Matsumoto, Hiroshi Funakubo. “MOCVD growth of β-FeSi2 film on modified Si surface by silver and enhancement of luminescence,” J. Cryst. Growth, Vol. 506, pp. 131-134, Jan. 2019.
      • Sang Mo Yang, Yeong Jae Shin, Yoshitaka Ehara, Hiroshi Funakubo, Jong-Gul Yoon, James F. Scott, Tae Won Noh. “Superdomain structure and high conductivity at the vertices in the (111)-oriented epitaxial tetragonal Pb(Zr,Ti)O3 thin film,” Current Applied Physics, Vol. 19, No. 4, pp. 418-423, Jan. 2019.

東京工業大学 物質理工学院 材料系 材料コース

舟窪研究室

〒226-8502 横浜市緑区長津田町4259-J2-43(J2棟15階1508室)

Funakubo Laboratory

Department of Innovative and Engineered Materials,
Interdisciplinary Graduate School of Science and Engineering,
Tokyo Institute of Technology

J2-43, 4259 Nagatsuta-cho, Midori-ku, Yokohama, 226-8502, JAPAN


E-mail : funakubo.h.aa[at]m.titech.ac.jp

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